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1. Equipment Overview:

Mainly used for 3-6 inch epitaxial growth of III-V compound semiconductor polycrystalline materials in multi-crystal synthesis processes, with an automatic control system.

2. Equipment Parameters and Types:

3. Main Features and Advantages of the Equipment

1★ Powerful operation functions with Windows interface and display screen operation, allowing users to conveniently modify process control parameters and display various process statuses in real time; equipped with fault self-diagnosis software to significantly reduce maintenance time;

2★ Reliable industrial computer + PLC mode for fully automatic furnace temperature control;

3★ Programs can achieve manual/automatic operation, and after power failure or intermediate shutdown, restarting allows temperature rise according to the manual process, saving process time;

4★ Multiple alarm functions and safety protection functions;
5★ Automatic adjustment of constant temperature zone, accurately controlling the actual process temperature of the reaction tube;